Success Stories: Advancing Device Miniaturization and Performance: NIW Secured for Principal Engineer Without RFE
Client’s Testimonial:
“My attorney has provided invaluable assistance throughout the entire course of case preparation. I extend my deepest gratitude.”
On August 25th, 2025, we received another EB-2 NIW (National Interest Waiver) approval for a Principal Engineer in the Field of Material Science (Approval Notice).
General Field: Material Science
Position at the Time of Case Filing: Principal Engineer
Country of Origin: Taiwan
Country of Residence at the Time of Filing: Taiwan
Approval Notice Date: August 25th, 2025
Processing Time: 1 year, 7 months, 13 days
Case Summary:
Advancing Critical Technologies
In the rapidly evolving field of semiconductor manufacturing, innovation in surface technologies and materials science is essential for maintaining U.S. leadership in high-tech industries. A material science expert has dedicated his research to developing cutting-edge surface technologies that enable device miniaturization, enhanced performance, and energy efficiency. His work addresses one of the most critical emerging technology areas, helping ensure that the United States remains competitive in global semiconductor innovation.
Research Contributions and National Impact
By improving the robustness and efficiency of semiconductor manufacturing, his research strengthens U.S. supply chains, mitigates global disruptions, and ensures the continuous availability of essential components. His methodologies and insights also advance materials innovation, nanomanufacturing, and advanced manufacturing processes, supporting both industry competitiveness and the creation of more powerful, feature-rich technologies that benefit consumers worldwide.
Academic Credentials and Scholarly Achievements
Our client earned a Ph.D. in Applied Chemistry, providing a strong foundation for his work at the intersection of materials science and semiconductor technology. His research accomplishments include:
- 12 peer-reviewed journal articles (2 first-authored)
- 51 citations reflecting the influence of his work
- Funded research from the National Science and Technology Council, Taiwan (NSTC, formerly MOST)
These achievements demonstrate both his productivity and his ability to produce research with measurable impact in his field.
NAILG’s Advocacy and Case Outcome
The researcher’s NIW petition was granted by USCIS without a Request for Evidence (RFE), recognizing the substantial merit of his work in surface technologies and semiconductor miniaturization. NAILG highlighted the practical and national significance of his research, documenting his publications, funded projects, and measurable impact on the industry. This approval ensures that our client can continue pioneering innovations that enhance device performance, strengthen semiconductor supply chains, and drive technological leadership in the United States.

